Magnetron Molybdenum Sputtering Target

Magnetron Molybdenum Sputtering Target


Magnetron molybdenum sputtering target purity is 99.95% and density is 10.2g/cm3. The melting point of it is 2610℃ and boiling point is 5560℃.


Magnetron molybdenum sputtering target has a lot of advantages such as high strength, high temperature resistance, wear resistance, corrosion resistance and other advantages.


The types of it include rectangle magnetron molybdenum sputtering target, rotatable magnetron molybdenum sputtering target and cylindrical magnetron tube molybdenum sputtering target.

Operating principle

The operating principle of magnetron molybdenum sputtering target is that electron affected by electric field so the electron in the process of flying to substrate will crash with argon ion to produce new ion. Then the new ion fly to substrate but due to affected by electric field so argon ion fly to cathode target and hit surface of target with high strength to make target sputtering.


It is widely used in two-dimensional display, thin-film solar cells, wiring material and barrier material of semiconductor.

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